New-Tech Europe Magazine | Q2 2023
the supply chain to jointly target net zero emissions for chip manufacturing. To quantify the environmental impact of a generic high-volume semiconductor fab, we are building a virtual fab, called imec.netzero. The developed models are continuously benchmarked and validated through partnerships with equipment and material suppliers. At the upcoming SPIE Advanced Lithography and Patterning conference, we will present a quantitative assessment of the impact of patterning on carbon emission during advanced IC manufacturing. High-impact areas have been identified and targeted for solutions in our actual fab. Examples include reduced use of fluorinated etch gases, reduced water use, recycling of rare materials, recovery of hydrogen, and lower dose lithography processes. We will present a quantitative assessment of the impact of patterning
on carbon emission during advanced IC manufacturing. Addressing environmental impact while developing future technologies may seem like a difficult and daunting task. It is. But we can do it. Our industry is known for its creativity and innovation, and we have now added one more development imperative: reduced environmental impact.” About Steven Scheer Steven Scheer was appointed as senior vice president of Advanced Patterning, Process and Materials (APPM) at imec in 2022, after joining imec as the vice president of APPM in 2019. His responsibilities include patterning, unit process and new materials development for logic, memory, photonics, and 3D integration. Prior to that, he was an account technology director with Tokyo Electron Ltd. (TEL), responsible for customers in the Portland OR area. He
worked at TEL for 13 years where he was responsible for R&D in patterning and cleans, including management roles in the US as well as at TEL’s factory in Kumamoto Japan and with the corporate R&D organization in Tokyo. He began his research career at IBM in Fishkill NY, working on 90 and 65 nm patterning development. He holds a Ph.D. in Chemical Engineering from the University of Texas at Austin.
Steven Scheer imec
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