Biophysical Society Thematic Meeting - June 28-July 1, 2015

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New Biological Frontiers Illuminated by Molecular Sensors and Actuators Poster Abstracts
10-POS Board 10
Fabrication of sub-20 nm Nanopore Arrays in Membranes with Embedded Metal
Electrodes at Wafer Scales
Yanxiao Feng1,2 , Jingwei Bai3, Gustavo Stolovitzky4, Jun Shen2, Deqiang Wang2.
1University of Chinese Academy of Sciences, Beijing, China, 2Chongqing Institute of Green and
Intelligent Technology, Chinese Academy of Sciences, Chongqing, China, 3 Illumina Inc, San
Diego, American Samoa, 4IBM, NewYork, American Samoa.
We introduce a method to fabricate solid-state nanopores with sub-20 nm diameter in
membranes with embedded metal electrodes across a 200 mm wafer using CMOS compatible
semiconductor processes.Multi-layer (metal–dielectric) structures embedded in membranes were
demonstrated to have high uniformity (1±0.5 nm) across the wafer. Arrays of nanopores were
fabricated with an average size of 18±2 nm in diameter using a Reactive Ion Etching (RIE)
method in lieu of TEM drilling. Shorts between the membrane-embedded metals were
occasionally created after pore formation, but the RIE based pores had a much better yield (99%)
of unshorted electrodes compared to TEM drilled pores (<10%). A doublestranded DNA of
length 1 kbp was translocated through the multi-layer structure RIE-based nanopore
demonstrating that the pores were open. The ionic current through the pore can be modulated
with a gain of 3 using embedded electrodes functioning as a gate in 0.1 mM KCl aqueous
solution. This fabrication approach can potentially pave the way to manufacturable nanopore
arrays with the ability to electrically control the movement of single or double-stranded DNA
inside the pore with embedded electrodes.